A novel atomic force microscope (AFM) is used to image a microlithographic sample. The AFM operates in the non destructive non-contact mode, uses glass tips as opposed to tungsten or silicon, and has an optical interferometric detection system. Its estimated lateral resolution is under 10 nanometers and much better in the z direction. A sample consisting of chrome features on quartz was produced for measurements using AFM and electric probe techniques. The features are single and grouped lines on the order of 1 .tm incorporated into an electric probe pad layout. Dimensions of these features are determined from the AFM images by relating their sizes in pixels to the excursions of the scanners during the formation of the images. These results are compared with measurements obtained through electric probing techniques.

Date of creation, presentation, or exhibit



Proceedings of the Integrated Circuit Metrology, Inspection, and Process Control VII, vol. 1926, San Jose, California, March 2, 1993 Note: imported from RIT’s Digital Media Library running on DSpace to RIT Scholar Works in February 2014.

Document Type

Conference Proceeding

Department, Program, or Center

Microelectronic Engineering (KGCOE)


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