We consider a continuum model for the evolution of an epitaxially strained dislocation-free thin solid film on a deformable substrate in the absence of vapor deposition. By using a thin-film approximation we derived a nonlinear evolution equation. We examined the nonlinear evolution equation and found that there is a critical film thickness below which every film thickness is stable and a critical wave number above which every film thickness is stable. Preliminary numerical results indicate that the equation possesses island-like steady state solutions.

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Copyright 2004 American Institute of Physics. All Rights Reserved. This article may be found on the publisher's website (additional fees may apply) at: http://scitation.aip.org/getabs/servlet/GetabsServlet?prog=normal&id=JAPIAU000096000010005505000001&idtype=cvips&gifs=yes This research was supported by the National Science Foundation under Grant No. DMS-0072532 (B.J.S.).ISSN:0021-8979 Note: imported from RIT’s Digital Media Library running on DSpace to RIT Scholar Works in February 2014.

Document Type


Department, Program, or Center

School of Mathematical Sciences (COS)


RIT – Main Campus